the Creative Commons Attribution 4.0 License.
the Creative Commons Attribution 4.0 License.
On some factors controlling fission-track etch rates in apatite
Abstract. Fission tracks in apatite must be etched to be counted and measured with an optical microscope. Track etching is described with the aid of two velocities: the track etch rate vT and the apatite etch rate vR. On their values depend the efficiencies of track counts, the selection of confined tracks for measurement, and the shapes of etched tracks; vR is an indicator of the apatite composition and annealing kinetics. In spite of this, direct measurements of vT and vR have long been wanting. This work provides numerical data and investigates factors controlling vT and vR. The results indicate that vT is constant over most of the ion- and fission-fragment ranges in apatite (constant core). We observed that, when using a step-etch protocol, the etchant advances at a high, but finite, rate along tracks etched in a preceding step. Thus, step-etching broadens the effective-etch-time distribution, and the summed etch time overestimates the aggregate effect of the procedure. Neither annealing of induced tracks nor ageing of fossil tracks has a measurable effect on vT. Since the vT-value along a particular track section does not depend on its radius or on the work expended to create it, it can be considered characteristic of an apatite instead of a track. This could account for the different vT of the Duluth and Durango apatites. The identical distributions of the host-confined-track intersections, c-axis angles, and track-etch rates across all experiments suggests that confined-track selection is little dependent on the track densities or lengths, but dominated by a condition that is unaffected by annealing. In contrast to vT, vR exhibits clear variation related to radiation damage from natural background radiation in the case of fossil tracks and from neutron irradiation in case of induced. Greater vR shorten the access times to confined tracks, increasing their effective etch times. This implies a need for caution when using Dpar to assess the annealing kinetics.
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Status: open (until 01 May 2026)
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RC1: 'Comment on egusphere-2026-889', Anonymous Referee #1, 03 Apr 2026
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AC1: 'Reply on RC1', Raymond Jonkheere, 14 Apr 2026
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Please see the attached pdf.
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AC1: 'Reply on RC1', Raymond Jonkheere, 14 Apr 2026
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RC2: 'Comment on egusphere-2026-889', Richard A. Ketcham, 10 Apr 2026
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See attached PDF
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AC2: 'Reply on RC2', Raymond Jonkheere, 14 Apr 2026
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Please see the attached pdf.
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AC2: 'Reply on RC2', Raymond Jonkheere, 14 Apr 2026
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See the attached PDF.